- manufacturer
- ROTH & RAU
- Type
- SINA XL
- Manufacture Date
- 2009
- Description
- PECVD reactor, 3 main chambers, process temp. 350 to 400 ºC, depositon rate between 20 to 100 nm/min, 3 pump units, wafer sizes [125x125, 156x156, 210x210], 67 seconds cycle time, max Thickness 300 µm / min Thickness 150 µm. Includes 10 carrier trays
- by order of:
- NetBid ESP SLU
*** ended *** ROTH & RAU SINA XL ROTH & RAU SINA XL PEVCD Reactor
PreviousAuction Type
Trading Premium- ends:
- 27/12/2017
11:00 - number of bids:
- 1 Gebot
- Status:
- Trading closed
- Item no.:
- X13845-11
- surcharge
- 15.00%
ROTH & RAU SINA XL PEVCD Reactor
Item no.: X13845-11
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Details ROTH & RAU SINA XL PEVCD Reactor
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Contact
Miguel Ángel Garcia Tel. +34 661 411 469, Email: garcia@netbid.com
Joachim Mink Tel. +49 172 755 65 76, Email: mink@netbid.com